XPS imaging




High pressure gas cell

Depth profiling with Ar+ gun

Charge compensation for insulating samples


Electron Analyzer

• Double-focusing full 180° spherical sector analyzer

• Magnetic and multi-element electrostatic input lenses

• Multi-channel spectroscopic detector

• 3 micron resolution 2-D image detector


Microfocused Monochromated

• AlKα X-ray Source

• 0.5 meter Rowland circle

• Microfocused electron gun

• Multi-position aluminum anode

• Two toroidal quartz crystals


Flood Gun

• Charge compensation

• Digital control

• Electron imaging


Ion Source

• Digital control

• Depth profiling

• Sample cleaning

• Secondary electron imaging



Automated 4-axis Sample Manipulator

• Interfaced to the data system


Avantage Software for data acquisition and analysis

• Instrument control

• Data acquisition and processing, peak fitting

• Multi-sample, multi-point data acquisition

• Unattended data acquisition


Sample Options

• 5-axes sample manipulator

• Sample heating and cooling


UV Photoelectron Spectroscopy (UPS)

• High intensity UV lamp

• Helium gas admission system


95nm-resolution AES/SEM/SAM Electron Gun

• Schottky type field emission source

• SEM detector


High Sensitivity

The combination of high efficiency lenses and detectors on ESCALAB 250 ensure the highest sensitivity in X-ray photoelectron spectroscopy (XPS) applications.


• High speed acquisition

• Excellent sensitivity with spatial resolution

• 106 counts/s in normal operating conditions (0.6 eV at FWHM, Ag sample)

• Maximum chemical detectability


Energy Resolution

ESCALAB 250 provides excellent energy resolution by combining an advanced analyzer design with a twin crystal microfocusing X-ray monochromator.


• Identification and quantification of chemical states

• Resolve interfaces and overlapping peaks


Fast Parallel Imaging XPS

Parallel imaging produces faster data acquisition with about 3-micron XPS resolution for chemical images. ESCALAB 250 is the instrument to use the same input lens and analyzer for both parallel imaging and spectroscopy.


• Imaging of both large and small features

• Eliminates the need to align two sets of electron optics


Auger Electron Spectroscopy

• 95 nm spot size at 5 nA

• SEM and SAM imaging


Small Area XPS (SAXPS)

• defined by x-rays gun small area from 120μm to 650μm

• Possible Lens defined small area down to < 20 μm



Insulating samples are analyzed using charge compensation with e- and Ar+ flood guns.


Sample Preparation

Samples should be less than 14mm, preferred size is about 3-5mm. The sample thickness should be less than 3mm.



Electron Spectroscopy for Chemical Analysis

Nanomaterials Core Characterization Facility

620 West Cary Street

Richmond, Virginia 23284

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