TECHNIQUE(S)

SEM, STEM

EDS

Nanolithography system

 

SCHEDULER

FORCE

The SU-70, incorporating Hitachi’s field-proven semi-in-lens technology and a new Schottky electron gun. It features not only ultra-high resolution (1.0 nm/15kV, 1.6nm/l kV), but also reduced charge-up imaging, compositional-contrast imaging, and ultra-low voltage imaging (deceleration mode) derived. Its Schottky electron gun, which can produce probe currents in excess of 200 nA, enables a wide variety of analytical capabilities at high throughput.

 

Sample preparation tools. Platinum and gold sputtering system for SEM, and carbon evaporator for EDS. Small speed diamond SAW for cutting samples.

Secondary electron image resolution

Magnification

Schottky emission gun‎ with probe current

5 axis motor-drive stage

Sample Size

Accessories

1.0 nm @ 15 kV; 1.6 nm @ 1 kV

20x - 800,000x

1 pA - 100 nA

X,Y: 0-110mm, Z: 1.5 - 40mm, Tilt: -5/+70 deg., Rotation: 360 deg.

Less than 150mm in diameter

 

EDS (EDAX system)

NPGS system for e-beam lithography

Dedicated back-scattered electron detector STEM

PICTURE TO BE UPDATED

HITACHI SU-70 FE-SEM

Ultra-High-Resolution Analytical FE-SEM SU-70

Nanomaterials Core Characterization Facility

620 West Cary Street

Richmond, Virginia 23284

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