The SU-70, incorporating Hitachi’s field-proven semi-in-lens technology and a new Schottky electron gun. It features not only ultra-high resolution (1.0 nm/15kV, 1.6nm/l kV), but also reduced charge-up imaging, compositional-contrast imaging, and ultra-low voltage imaging (deceleration mode) derived. Its Schottky electron gun, which can produce probe currents in excess of 200 nA, enables a wide variety of analytical capabilities at high throughput.
Sample preparation tools. Platinum and gold sputtering system for SEM, and carbon evaporator for EDS. Small speed diamond SAW for cutting samples.
Secondary electron image resolution
Schottky emission gun with probe current
5 axis motor-drive stage
1.0 nm @ 15 kV; 1.6 nm @ 1 kV
20x - 800,000x
1 pA - 100 nA
X,Y: 0-110mm, Z: 1.5 - 40mm, Tilt: -5/+70 deg., Rotation: 360 deg.
Less than 150mm in diameter
EDS (EDAX system)
NPGS system for e-beam lithography
Dedicated back-scattered electron detector STEM
PICTURE TO BE UPDATED
HITACHI SU-70 FE-SEM
Ultra-High-Resolution Analytical FE-SEM SU-70
Safety and training documents (will soon link to safety page)
Nanomaterials Core Characterization Facility
620 West Cary Street
Richmond, Virginia 23284
Director: Everett E Carpenter, Ph.D.
Copyright ©Virginia Commonwealth University Nanoscience and Nanotechnology Program. All Rights Reserved.